New Nanopatterning Method Impacts AF Needs of Today and Tomorrow Published Nov. 19, 2008 By Maria Callier Air Force Office of Scientific Research ARLINGTON, Va. -- Princeton University professor and AFRL-funded researcher Dr. Craig Arnold is investigating a new approach to optical nanopatterning, the process of forming nanometer-scale patterns on a substrate. Standard nanopatterning creates highly precise patterns in controlled, clean, and vibration-free environments. Consequently, many traditional Department of Defense and AFRL technologies rely on it for applications involving microelectronics; space-based or other remote platforms; small-scale development; and even large-scale aircraft and munitions. A new direct-write approach for leveraging this important patterning capability will thus impact a variety of current and future Air Force (AF) needs. The properties inherent to nanomaterials afford researchers the opportunity to work with substances--namely, low-temperature, non-vacuum-compatible, and flexible substrates--that are traditionally difficult to pattern. Dr. Arnold's research team performed all tests associated with this effort in an office environment, on an optical bench with no vibration control. In an AF context, the simplicity of this test environment implies that it may be possible to implement the emergent technique to repair and modify materials in the field, and possibly even aboard moving aircraft. Researchers used optical tweezers to manipulate beads about the substrate surface,firing a high-power, pulsed ultraviolet laser in any location requiring modification beneath a given bead. Importantly, test results indicate that this method accommodates parallel nanopatterning on all kinds of surfaces. Further, the approach eliminates the major drawbacks of conventional laser-based patterning techniques, slow speed and substrate damage, while achieving higher resolution.