Atomic Layer Deposition

Transmission Electron Microscopy (TEM) image of aluminum oxide ALD on a boron nitride nanoparticle. (Image courtesy of Steven M. George, University of Colorado, Boulder)

Atomic Layer Deposition

Steven M. George a professor of chemistry and chemical engineering at the University of Colorado, Boulder has been responsible for several unique breakthroughs in the field of Atomic Layer Deposition, or ALD. The ALD method allows one to control the physical and chemical properties of materials one atomic layer at a time, and depending on what materials you are depositing on a surface, you get different results—and some are incredibly unique. (Image courtesy of Steven M. George, University of Colorado, Boulder)

Dark-field optical image

A dark-field optical image of a silicon photonic chip is shown in comparison to the size of a penny.(Credit: Elijah Douglas Christenson)

AFOSR MC Kick-off Event for University Nanosat Program Occurs January 17, 2011 in Albuquerque, N.M.

NS-3 winner FASTRAC on its way to orbit. (Credit: David Voss, AFRL)

Benter Award Winner Explores the World of Imaging Research

Dr. George Papanicolaou, AFRL-funded researcher and Stanford University mathematics professor, earned the first William Benter Prize in Applied Mathematics. The biennial honor recognizes his mathematical contributions to solving problems in engineering, physics, and similarly complex arenas. (Photo courtesy of Stanford University)

AFOSR MC Nanostructuring Technology Creates Energy Efficient and Ultra-Small Displays

Schematic of color filters made of Plasmonic nano-resonators (Credit: to L. Jay Guo of University of Michigan)